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Ion source Product List and Ranking from 8 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

Ion source Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. 日本ウォーターズ（米国本社 Waters Corporation）　 Tokyo//Testing, Analysis and Measurement
  2. アリオス Tokyo//Industrial Machinery
  3. エル・イー・テクノロジーズ Saitama//Testing, Analysis and Measurement
  4. 4 ノベリオンシステムズ Kyoto//Manufacturing and processing contract
  5. 4 VISTA Yamanashi//Industrial Electrical Equipment
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Ion source Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Soft Ionization Technology 'APGC' Without Helium Gas 日本ウォーターズ（米国本社 Waters Corporation）　
  2. Plasma-related products RF radical beam source IRFS-504 アリオス
  3. ECR line beam ion source "ELBS-150" ノベリオンシステムズ
  4. ESI Robot Ion Source "TriVersa NanoMate" エル・イー・テクノロジーズ
  5. 4 Robot ion source "TriVersa NanoMate" ライフィクスアナリティカル

Ion source Product List

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Soft Ionization Technology 'APGC' Without Helium Gas

Soft Ionization Technology 'APGC' Without Helium Gas

Are you having trouble procuring helium gas for GC-MS analysis? Achieve high-sensitivity analysis without being affected by carrier gas.

APGC (Atmospheric Pressure Gas Chromatography) is a soft ionization technology that features excellent ionization efficiency and high sensitivity. It allows for a quick and easy switch of the MS inlet system from LC to GC without releasing the vacuum. Due to the absence of vacuum constraints, a wider range of GC columns and carrier gas flow rates can be utilized, maximizing the functionality of GC. 【Features】 ■ APGC ion source unaffected by carrier gas ■ Avoids sensitivity loss due to fragmentation ■ Operates stably for long periods without ion burn *For more details, please refer to the PDF document or feel free to contact us.

  • APGC画像.jpg
  • Gas chromatograph
  • Other separation and analysis equipment
  • Gas chromatograph

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Plasma-related products RF radical beam source IRFS-504

Plasma-related products RF radical beam source IRFS-504

Chemically active radicals are formed by ICP-type RF discharge, and the flux is drawn out by differential pressure.

The discharge section and the extraction section are made of high-purity PBN, allowing for long-term stable operation even during the introduction of reactive gases, and enabling the generation of a clean atomic and radical beam. It has particularly proven effective as a nitrogen radical source, with a wealth of experience.

  • Other energy equipment
  • Other safety equipment

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Amperage-class ion source for milling equipment

Amperage-class ion source for milling equipment

Custom-made options are available to meet your needs for ion sources for MEMS processing equipment!

This product is a large ion source suitable for high-speed milling processing using a large-area ion beam. By adopting heat-resistant/low-sputter-rate electrode materials, it generates low-energy ampere-class ion beams. We offer custom-made solutions to meet your requirements. 【Features】 ■ Optimization of beam uniformity through charged particle trajectory simulation ■ Adoption of heat-resistant/low-sputter-rate electrode materials ■ Generation of low-energy ampere-class ion beams *For more details, please refer to the PDF document or feel free to contact us.

  • Electron beam lithography equipment
  • Other machine elements

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ECR line beam ion source "ELBS-150"

ECR line beam ion source "ELBS-150"

Beam energy 100 to 2,000 eV! Uniform long ion beam with innovative magnetic circuit design.

The "ELBS-150" is a line beam ion source of the ECR (Electron Cyclotron Resonance) discharge type that can be applied to reactive ion beam milling equipment. It features high-power microwave drive with a newly developed large coaxial input terminal (7/16 type). It can be applied to milling of magnetic heads and trimming adjustments of high-frequency circuits. 【Features】 - Uniform long ion beam due to innovative magnetic circuit design - High-power microwave drive with newly developed large coaxial input terminal (7/16 type) - Dielectric lining that is metal contamination-free - Newly developed long-life beam electrode *For more details, please refer to the PDF document or feel free to contact us.

  • Electron beam lithography equipment
  • Other machine elements

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Robot ion source "TriVersa NanoMate"

Robot ion source "TriVersa NanoMate"

Long-duration spraying of trace samples is possible! Introducing a robotic ion source with two analysis modes.

The "TriVersa NanoMate" is a robotic ion source that combines conductive pipette tips and micro nozzles to analyze all LC/MS analyses at nano flow rates. There are analytical applications in fields such as medicine, biotechnology, and microbial culture. Additionally, it features two analysis modes: the "Infusion mode," which allows for long-duration spraying of small samples, and the "On-Line Fraction Correction mode," which makes MSn analysis easy. 【Infusion mode Features】 - Long spray duration (10 to 20 minutes per 1μL) - 100% elimination of contamination and carryover between samples - No need to increase the volume to 100 to 200μL even when analyzing small samples (around 10μL) *For more details, please refer to the PDF materials or feel free to contact us.

  • Power Supplies
  • Analytical Equipment and Devices
  • others

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DART ion source

DART ion source

A new ion source that can rapidly analyze samples of various forms and states without pre-treatment.

Japan Electronic Co., Ltd. DART was born in 2003 at the mass spectrometry application research laboratory of JEOL USA, Inc., the U.S. subsidiary of Japan Electronic. The DART ion source was developed on the AccuTOF, and by attaching it to the AccuTOF LC-Express, it delivers the best performance. You can obtain high-resolution mass spectra in real-time simply by presenting samples of various forms and states to the DART ion source without any pretreatment. 〇 Features - Pioneer of ambient mass spectrometry: DART - Direct analysis without pretreatment - The best combination: AccuTOF LC-Express + DART - Operating principle of DART *Please feel free to contact us for more details.

  • Analytical Equipment and Devices

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TELEMARK Ion Source Series for Ion-Assisted Deposition

TELEMARK Ion Source Series for Ion-Assisted Deposition

We provide the ideal ion source for ion assist deposition.

We provide the ideal ion source for ion-assisted deposition made by TELEMARK. The ion-assisted deposition (IAD) technology is a process that enables high-density and stable film formation without excessive substrate heating. TELEMARK's gridless ion source system allows for stable ion-assisted deposition on various substrates such as glass, plastic, and metal, thanks to its uniquely designed ion source.

  • Company：VISTA
  • Price：1 million yen-5 million yen
  • Evaporation Equipment
  • Other physicochemical equipment
  • Vacuum Equipment

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Microwave Ion Source EMIS-221C

Microwave Ion Source EMIS-221C

Microwave Ion Source EMIS-221C

Microwave Excitation Ion Source with Magnetic Field, External Chamber Type, Lamic Discharge Tube Type 【Features】 ○ Ion beams with low metal contamination can be obtained due to ultra-high vacuum specifications. ○ The plasma chamber is made of high-purity alumina, allowing for ion beams with low metal contamination. ○ Can be used with various ultra-high vacuum devices, such as MBE systems, due to a completely metal-sealed structure. ○ Ion acceleration is possible with the use of a high-voltage power supply (optional) (can also be used as a radical source or plasma source). ○ Microwave is supplied via a coaxial cable, eliminating the need for cumbersome waveguide connections. ○ External control via sequencer or computer is possible. ● For other functions and details, please download the catalog.

  • Etching Equipment
  • Other semiconductor manufacturing equipment

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ESI Robot Ion Source "TriVersa NanoMate"

ESI Robot Ion Source "TriVersa NanoMate"

It is a robot ion source for LC/MS that enables high-sensitivity analysis of trace samples.

The "TriVersa NanoMate" makes it easy to perform nano LC/MS, which has been difficult until now. Samples fractionated on the plate are linked to MS data, allowing for long-term spraying in Infusion mode as samples for MS/MS analysis, significantly improving S/N. We also offer an upgrade kit for the "TriVersa NanoMate," the "LESA Upgrade Kit." 【Features】 ○ High sensitivity ○ Infusion nano-Spray ○ Easy MSn analysis with On-Line Spray & Fraction Collection ○ LC/MS analysis from pathological frozen sections For more details, please contact us or download the catalog.

  • Analytical Equipment and Devices

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High Current DC Discharge Type Line Beam Ion Source 'LBS-120HC'

High Current DC Discharge Type Line Beam Ion Source 'LBS-120HC'

Compatible with large substrates! High-speed beam adjustment using a fully automated power control system.

The "LBS-120HC" is a high-current DC discharge line beam ion source that can be applied to high-speed ion beam milling equipment. It features a high-current density ion beam using a thermionic cathode, with excellent beam distribution uniformity achieved through optimized magnetic field design. Additionally, we offer a dedicated power supply "SPS-HC2" designed for fully automated high-speed beam adjustment. 【LBS-120HC Features】 ■ High-current density ion beam using a thermionic cathode ■ Excellent beam distribution uniformity due to optimized magnetic field design ■ High-speed beam adjustment through a fully automated power control system ■ Equipped with a neutralizer *For more details, please refer to the PDF document or feel free to contact us.

  • Ion implantation equipment
  • DC Motor

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Ionization using argon gas - Ambient ion source 'DCDI'

Ionization using argon gas - Ambient ion source 'DCDI'

Solid, liquid, and gas samples can be easily measured without any pre-treatment.

The "DCDI" is an ion source that utilizes the ionization method (Japanese Patent Application No. 2017-045571). While using argon gas, it enables ionization that is very similar to the DART ionization method using helium gas (this may vary depending on the sample). It allows for measurement of solid, liquid, and gas samples simply by presenting them without any pretreatment, making it a convenient and flexible ambient ion source. 【System Configuration】 ■ Interface (integrated needle type) ■ High voltage unit ■ Gas heating section ■ GH controller ■ Ceramic tube, etc. *For more details, please download the PDF or feel free to contact us.

  • Other experimental equipment and supplies

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ESI Robot Ion Source "TriVersa NanoMate"

ESI Robot Ion Source "TriVersa NanoMate"

Robot ion source for LC/MS enabling high-sensitivity analysis of trace samples.

The "TriVersa NanoMate" is a device that makes it easy to perform nano LC/MS, which has been difficult until now. Samples fractionated on the plate are linked to MS data, allowing for long-duration spraying in Infusion mode as samples for MS/MS analysis, significantly improving the S/N ratio. An upgrade kit for the "TriVersa NanoMate," the "LESA Upgrade Kit," is also available. 【Features】 ■ High sensitivity ■ Infusion nano-Spray ■ Easy MSn analysis with On-Line Spray & Fraction Collection ■ LC/MS analysis from pathological frozen sections is possible *For more details, please contact us or download the catalog.

  • Other analytical and testing equipment

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